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| 沉积温度对磁控溅射镀钌薄膜微观结构和附着力的影响 |
| Effect of deposition temperature on microstructure and adhesion of ruthenium film plated by magnetron sputtering |
| 投稿时间：2016-10-09 |
| DOI： |
| 中文关键词: 钌薄膜 钼基片 磁控溅射 镀膜 沉积温度 附着力 微观结构 |
| 英文关键词: ruthenium film molybdenum substrate magnetron sputtering coating film deposition temperature adhesion microstructure |
| 基金项目: |
| 作者 | 单位 | E-mail | | 王盼 | 武汉科技大学材料与冶金学院,湖北 武汉,430081 | 2577473358@qq.com | | 潘应君 | 武汉科技大学材料与冶金学院,湖北 武汉,430081 | | | 洪波 | 武汉科技大学材料与冶金学院,湖北 武汉,430081 | | | 徐源源 | 武汉科技大学材料与冶金学院,湖北 武汉,430081 | | | 杨林 | 武汉科技大学材料与冶金学院,湖北 武汉,430081 | |
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| 中文摘要: |
| 采用中频磁控溅射技术在钼圆片表面镀覆钌薄膜,通过X射线衍射仪、扫描电镜、平整度仪、宏观浸蚀试验和百格测试等对镀层进行表征和检测,研究不同沉积温度对薄膜微观结构和附着力的影响。结果表明,随着沉积温度由室温升至200 ℃,钌薄膜的表面平整性和致密性逐步改善,附着力得以提高；200 ℃沉积薄膜的膜/基结合力最大,其微观结构、致密性等也均达到最优；但当沉积温度进一步提高到300 ℃时,钌薄膜的表面起伏反而增大,附着力有所下降。 |
| 英文摘要: |
| Ruthenium films were prepared on molybdenum discs by intermediate frequency magnetron sputtering, then characterized and tested by X-ray diffractometer, scanning electron microscope, flatness tester, macro-etching test and cross cut test. Effects of deposition temperature on microstructure and adhesion of the films were discussed. The results show that the compactness, smoothness and adhesion of ruthenium film are improved with the increase of deposition temperature from indoor temperature to 200 ℃. Ru film deposited at 200 ℃ has the greatest coating-substrate adhesive force and the optimal microstructure and compactness. However, when the deposition temperature rises to 300 ℃, the surface fluctuation of ruthenium film increases and its adhesion declines. |
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